Original Publication Date
Applied Physics Letters
DOI of Original Publication
Date of Submission
Significant improvement of structural and optical qualities of GaNthin films on sapphire substrates was achieved by metal organic chemical vapor deposition with in situ SiNxnanonetwork. Transmission electron microscope (TEM) studies revealed that screw- and edge-type dislocations were reduced to 4.4×107 and 1.7×107cm−2, respectively, for a ∼5.5-μm-thick layer. Furthermore, room temperature carrier lifetimes of 2.22 and 2.49ns were measured by time-resolved photoluminescence(TRPL) for samples containing single and double SiNx network layers, respectively, representing a significant improvement over the previous studies. The consistent trends among the TEM,x-ray diffraction, and TRPL measurements suggest that in situ SiNx network reduces line defects effectively as well as the point-defect-related nonradiative centers.
Xie, J., Özgür, Ü., Fu, Y., et al. Low dislocation densities and long carrier lifetimes in GaN thin films grown on a SiNx nanonetwork. Applied Physics Letters, 90, 041107 (2007). Copyright © 2007 AIP Publishing LLC.
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VCU Electrical and Computer Engineering Publications