Document Type


Original Publication Date


Journal/Book/Conference Title

Journal of Applied Physics





DOI of Original Publication



Originally published at

Date of Submission

October 2015


Electrical behavior of Sb in ZnO:Sb layers doped in a wide concentration range was studied using temperature dependent Hall effect measurements. The layers were grown by plasma-enhanced molecular beam epitaxy, and the Sb concentration was changed by varying the Sb flux, resulting in electron concentrations in the range of 1016 to nearly 1020 cm−3. Upon annealing, the electron concentration increased slightly and more notable was that the electron mobility significantly improved, reaching a room-temperature value of 110 cm2/V s and a low-temperature value of 145 cm2/V s, close to the maximum of ∼155 cm2/V s set by ionized impurity scattering. Hall data and structural data suggest that Sb predominantly occupies Zn sublattice positions and acts as a shallow donor in the whole concentration range studied. In the layers with high Sb content (∼1 at. %), acceptor-type compensating defects (possibly Sb on oxygen sites and/or point-defect complexes involving SbO) are formed. The increase of electron concentration with increasing oxygen pressure and the increase in ZnO:Sb lattice parameter at high Sb concentrations suggest that acceptors involving SbO rather than SbZn-2VZn complexes are responsible for the compensation of the donors.


Liu, H. Y., Izyumskaya, N., & Avrutin V., et al. Donor behavior of Sb in ZnO. Journal of Applied Physics, 112, 033706 (2012). Copyright © 2012 American Institute of Physics.

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VCU Electrical and Computer Engineering Publications