Document Type
Article
Original Publication Date
2006
Journal/Book/Conference Title
Applied Physics Letters
Volume
89
Issue
15
DOI of Original Publication
10.1063/1.2359294
Date of Submission
April 2015
Abstract
Room temperature and temperature dependent current-voltage characteristics of Ni∕AuSchottky diodes fabricated on undoped GaN prepared with and without in situ SiNxnanonetwork by metal organic chemical vapor deposition have been studied. The features of the Schottky diodes depend strongly on the SiNx deposition conditions, namely, its thickness. Reduction in the point and line defect densities caused the Schottky barrier height to increase to1.13eV for 5min SiNx deposition time as compared to 0.78eV without SiNx nanonetwork. Similarly, the breakdown voltage also improved from 76V for the reference to 250V when SiNx nanonetwork was used. With optimized SiNx nanonetwork, full width at half maximum values of (0002) and (101¯2) x-ray rocking curves improved to 217 and 211arcsec, respectively, for a 5.5μm thick layer, as compared to 252 and 405arcsec for a reference sample of the same thickness, which are comparable to literature values. The photoluminescence linewidth also reduced to 2.5meV at 15K with free excitons A and B clearly resolvable.
Rights
Xie, J., Fu, Y., Ni, X., et al. I-V characteristics of Au∕Ni Schottky diodes on GaN with SiNx nanonetwork. Applied Physics Letters, 89, 152108 (2006). Copyright © 2006 AIP Publishing LLC.
Is Part Of
VCU Electrical and Computer Engineering Publications
Comments
Originally published at http://dx.doi.org/10.1063/1.2359294