Document Type
Article
Original Publication Date
2006
Journal/Book/Conference Title
Journal of Applied Physics
Volume
99
Issue
3
DOI of Original Publication
10.1063/1.2170422
Date of Submission
October 2015
Abstract
We report on the effectiveness of porous TiN nanonetworks on the reduction of threading dislocations (TDs) in GaN grown by metal-organic vapor-phase epitaxy (MOVPE). The porous TiN networks were formed by in situ annealing of thin-deposited Ti films deposited ex situ on GaN templates within the MOVPE growth chamber. Different annealing parameters in relation to surface porosity of TiN networks were investigated. Transmission electron micrographs indicated dislocation reduction by factors of up to 10 in GaN layers grown on the TiN nanonetwork, compared with a control sample. TiN prevented many dislocations present in the GaN templates from penetrating into the upper layer. Microscale epitaxial lateral overgrowth of GaN above TiN also contributed to TD reduction. The surface porosity of the TiN network had a strong impact on the efficiency of TD reduction. X-ray-diffraction and time-resolved photoluminescence measurements further confirmed the improved GaN quality.
Rights
Fu, Y., Yun, F., Moon, Y. T., et al. Dislocation reduction in GaN grown on porous TiN networks by metal-organic vapor-phase epitaxy. Journal of Applied Physics 99, 033518 (2006). Copyright © 2006 AIP Publishing LLC.
Is Part Of
VCU Electrical and Computer Engineering Publications
Comments
Originally published at http://dx.doi.org/10.1063/1.2170422